Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature: Fid-Bau Portal

Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature

Wang, X. Q. / He, D. Y. / Li, J. S.

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Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature

Wang, X. Q. / He, D. Y. / Li, J. S.

Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature

Wang, X. Q. / He, D. Y. / Li, J. S.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature

Contributors:

Wang, X. Q. (author) / He, D. Y. (author) / Li, J. S. (author) / Pan, W. / Gong, J.

Published in:

Proceedings of the Fourth China International Conference on High-Performance Ceramics (CICC-4) (Incorporating the Second International Workshop on Layered and Graded Materials and the First Satellite Symposium on Thermoelectrics) Chengdu, China, October 23 ∼ 26, 2005 ; 2228-2231

KEY ENGINEERING MATERIALS ; 336/338

Publication date:

2007-01-01

Size:

4 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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