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Highly accurate shave-off depth profiling by simulation method
Highly accurate shave-off depth profiling by simulation method
Highly accurate shave-off depth profiling by simulation method
Fujii, M. (Autor:in) / Nakamura, K. (Autor:in) / Ishizaki, Y. (Autor:in) / Nojima, M. (Autor:in) / Owari, M. (Autor:in) / Nihei, Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 255 ; 1354-1356
01.01.2008
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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