Ultra low energy SIMS depth profiling of sub-1.5nm silicon oxynitride films

Mulcahy, C. P. / Bock, B. / Ebblewhite, P. A. et al. | British Library Online Contents | 2006

Compositional depth profiling of ultrathin oxynitride/Si interface using XPS

Kato, H. / Nishizaki, K. / Takahashi, K. et al. | British Library Online Contents | 2002

NH3-RTP grown ultra-thin oxynitride layers for MOS gate applications

Chung, H. Y. / Dietl, W. / Niess, J. et al. | British Library Online Contents | 2005

Quantitative depth profiling of nitrogen in ultrathin oxynitride film with low energy SIMS

Shon, H. K. / Kang, H. J. / Hong, T. E. et al. | British Library Online Contents | 2003

Investigation of Ultra Thin Thermal Nitrided Gate Dielectrics in Comparison to Plasma Nitrided Gate Dielectrics for High-Performance Logic Application for 65nm

Trentzsch, M. / Golz, C. / Wieczorek, K. et al. | British Library Online Contents | 2008