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Evaluation of the barrier capability of Zr-Si films with different substrate temperature for Cu metallization
Evaluation of the barrier capability of Zr-Si films with different substrate temperature for Cu metallization
Evaluation of the barrier capability of Zr-Si films with different substrate temperature for Cu metallization
Wang, Y. (Autor:in) / Cao, F. (Autor:in) / Ding, M. h. (Autor:in) / Shao, L. (Autor:in)
APPLIED SURFACE SCIENCE ; 255 ; 4738-4741
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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