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InAs0.45P0.55/InP strained multiple quantum wells intermixed by inductively coupled plasma etching
InAs0.45P0.55/InP strained multiple quantum wells intermixed by inductively coupled plasma etching
InAs0.45P0.55/InP strained multiple quantum wells intermixed by inductively coupled plasma etching
Cao, M. (Autor:in) / Wu, H. Z. (Autor:in) / Lao, Y. F. (Autor:in) / Cao, C. F. (Autor:in) / Liu, C. (Autor:in)
MATERIALS RESEARCH BULLETIN ; 44 ; 2217-2221
01.01.2009
5 pages
Aufsatz (Zeitschrift)
Englisch
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