InAs0.45P0.55/InP strained multiple quantum wells intermixed by inductively coupled plasma etching: Fid-Bau Portal

InAs0.45P0.55/InP strained multiple quantum wells intermixed by inductively coupled plasma etching

Cao, M. / Wu, H. Z. / Lao, Y. F. / Cao, C. F. / Liu, C.

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InAs0.45P0.55/InP strained multiple quantum wells intermixed by inductively coupled plasma etching

Cao, M. / Wu, H. Z. / Lao, Y. F. / Cao, C. F. / Liu, C.

InAs0.45P0.55/InP strained multiple quantum wells intermixed by inductively coupled plasma etching

Cao, M. / Wu, H. Z. / Lao, Y. F. / Cao, C. F. / Liu, C.

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Document information

Title:

InAs0.45P0.55/InP strained multiple quantum wells intermixed by inductively coupled plasma etching

Contributors:

Cao, M. (author) / Wu, H. Z. (author) / Lao, Y. F. (author) / Cao, C. F. (author) / Liu, C. (author)

Published in:

MATERIALS RESEARCH BULLETIN ; 44 ; 2217-2221

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0025-5408

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11 / 620

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