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Composition and Properties of Silicon Nitride Thin Films Deposited by Mid-frequency Dual-target Unbalanced Magnetron Sputtering
Composition and Properties of Silicon Nitride Thin Films Deposited by Mid-frequency Dual-target Unbalanced Magnetron Sputtering
Composition and Properties of Silicon Nitride Thin Films Deposited by Mid-frequency Dual-target Unbalanced Magnetron Sputtering
Wang, C. (Autor:in) / Mu, Z.-x. (Autor:in) / Liu, B.-b. (Autor:in) / Zang, H.-r. (Autor:in) / Mu, X.-d. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 29 ; 331-336
01.01.2011
6 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.11
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