Composition and Properties of Silicon Nitride Thin Films Deposited by Mid-frequency Dual-target Unbalanced Magnetron Sputtering: Fid-Bau Portal

Composition and Properties of Silicon Nitride Thin Films Deposited by Mid-frequency Dual-target Unbalanced Magnetron Sputtering

Wang, C. / Mu, Z.-x. / Liu, B.-b. / Zang, H.-r. / Mu, X.-d.

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Composition and Properties of Silicon Nitride Thin Films Deposited by Mid-frequency Dual-target Unbalanced Magnetron Sputtering

Wang, C. / Mu, Z.-x. / Liu, B.-b. / Zang, H.-r. / Mu, X.-d.

Composition and Properties of Silicon Nitride Thin Films Deposited by Mid-frequency Dual-target Unbalanced Magnetron Sputtering

Wang, C. / Mu, Z.-x. / Liu, B.-b. / Zang, H.-r. / Mu, X.-d.

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Check availability in my library

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Document information

Title:

Composition and Properties of Silicon Nitride Thin Films Deposited by Mid-frequency Dual-target Unbalanced Magnetron Sputtering

Contributors:

Wang, C. (author) / Mu, Z.-x. (author) / Liu, B.-b. (author) / Zang, H.-r. (author) / Mu, X.-d. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 29 ; 331-336

Publication date:

2011-01-01

Size:

6 pages

ISSN:

1673-2812

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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