Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Bauer, W. A. (Autor:in) / Neuber, C. (Autor:in) / Ober, C. K. (Autor:in) / Schmidt, H. W. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 23 ; 5404-5408
01.01.2011
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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