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A platform for research: civil engineering, architecture and urbanism
Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Bauer, W. A. (author) / Neuber, C. (author) / Ober, C. K. (author) / Schmidt, H. W. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 23 ; 5404-5408
2011-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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