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Characterization of SiO~2/SiC Interfaces Annealed in N~2O or POCl~3
Characterization of SiO~2/SiC Interfaces Annealed in N~2O or POCl~3
Characterization of SiO~2/SiC Interfaces Annealed in N~2O or POCl~3
Fiorenza, P. (Autor:in) / Swanson, L.K. (Autor:in) / Vivona, M. (Autor:in) / Giannazzo, F. (Autor:in) / Bongiorno, C. (Autor:in) / Lorenti, S. (Autor:in) / Frazzetto, A. (Autor:in) / Roccaforte, F. (Autor:in) / Okumura, H. / Harima, H.
01.01.2014
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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