Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Low temperature processed InGaZnO thin film transistor using the combination of hydrogen irradiation and annealing
Low temperature processed InGaZnO thin film transistor using the combination of hydrogen irradiation and annealing
Low temperature processed InGaZnO thin film transistor using the combination of hydrogen irradiation and annealing
Park, H. W. (Autor:in) / Choi, M. J. (Autor:in) / Jo, Y. (Autor:in) / Chung, K. B. (Autor:in)
APPLIED SURFACE SCIENCE ; 321 ; 520-524
01.01.2014
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Dependence of annealing on stability of transparent amorphous InGaZnO thin film transistor
British Library Online Contents | 2013
|Development of annealing process for solution-derived high performance InGaZnO thin-film transistors
British Library Online Contents | 2013
|Microstructural Characteristics of InGaZnO Thin Film Using an Electrical Current Method
British Library Online Contents | 2012
|Flexible Electronics Based on InGaZnO Transparent Thin Film Transistors
British Library Online Contents | 2012
|Improvements in passivation effect of amorphous InGaZnO thin film transistors
British Library Online Contents | 2014
|