Optical and electrical properties of H2 plasma-treated ZnO films prepared by atomic layer deposition using supercycles: Fid-Bau Portal

Optical and electrical properties of H2 plasma-treated ZnO films prepared by atomic layer deposition using supercycles

Uprety, Prakash / Macco, Bart / Junda, Maxwell M. / Grice, Corey R. / Kessels, Wilhelmus M.M. / Podraza, Nikolas J.

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Optical and electrical properties of H2 plasma-treated ZnO films prepared by atomic layer deposition using supercycles

Uprety, Prakash / Macco, Bart / Junda, Maxwell M. / Grice, Corey R. / Kessels, Wilhelmus M.M. / Podraza, Nikolas J.

Optical and electrical properties of H2 plasma-treated ZnO films prepared by atomic layer deposition using supercycles

Uprety, Prakash / Macco, Bart / Junda, Maxwell M. / Grice, Corey R. / Kessels, Wilhelmus M.M. / Podraza, Nikolas J.

Zugriff

Zugriff über TIB

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Dokumentinformationen

Titel:

Optical and electrical properties of H2 plasma-treated ZnO films prepared by atomic layer deposition using supercycles

Beteiligte:

Uprety, Prakash (Autor:in) / Macco, Bart (Autor:in) / Junda, Maxwell M. (Autor:in) / Grice, Corey R. (Autor:in) / Kessels, Wilhelmus M.M. (Autor:in) / Podraza, Nikolas J. (Autor:in)

Erschienen in:

Materials science in semiconductor processing ; 84 ; 91-100

Erscheinungsdatum:

01.01.2018

Format / Umfang:

10 pages

ISSN:

1369-8001

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.38152

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