Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation: Fid-Bau Portal

Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation

Kim, Seung Hyun / Seok, Tae Jun / Jin, Hyun Soo / Kim, Woo-Byoung / Park, Tae Joo

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Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation

Kim, Seung Hyun / Seok, Tae Jun / Jin, Hyun Soo / Kim, Woo-Byoung / Park, Tae Joo

Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation

Kim, Seung Hyun / Seok, Tae Jun / Jin, Hyun Soo / Kim, Woo-Byoung / Park, Tae Joo

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Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Titel:

Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation

Beteiligte:

Kim, Seung Hyun (Autor:in) / Seok, Tae Jun (Autor:in) / Jin, Hyun Soo (Autor:in) / Kim, Woo-Byoung (Autor:in) / Park, Tae Joo (Autor:in)

Erschienen in:

Applied surface science ; 365 ; 376-379

Erscheinungsdatum:

01.01.2016

Format / Umfang:

4 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.44

Kim, S. H. / Seok, T. J. / Jin, H. S. et al. | British Library Online Contents | 2016

Trends of structural and electrical properties in atomic layer deposited HfO2 films

Scarel, G. / Spiga, S. / Wiemer, C. et al. | British Library Online Contents | 2004

Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface

Patil, V.S. / Agrawal, K.S. / Khairnar, A.G. et al. | British Library Online Contents | 2017

Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface

Patil, V.S. / Agrawal, K.S. / Khairnar, A.G. et al. | British Library Online Contents | 2017

Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition

Chesnokov, Y. M. / Miakonkikh, A. V. / Rogozhin, A. E. et al. | British Library Online Contents | 2018

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