Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation: Fid-Bau Portal

Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation

Kim, Seung Hyun / Seok, Tae Jun / Jin, Hyun Soo / Kim, Woo-Byoung / Park, Tae Joo

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation

Kim, Seung Hyun / Seok, Tae Jun / Jin, Hyun Soo / Kim, Woo-Byoung / Park, Tae Joo

Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation

Kim, Seung Hyun / Seok, Tae Jun / Jin, Hyun Soo / Kim, Woo-Byoung / Park, Tae Joo

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation

Contributors:

Kim, Seung Hyun (author) / Seok, Tae Jun (author) / Jin, Hyun Soo (author) / Kim, Woo-Byoung (author) / Park, Tae Joo (author)

Published in:

Applied surface science ; 365 ; 376-379

Publication date:

2016-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.44

Kim, S. H. / Seok, T. J. / Jin, H. S. et al. | British Library Online Contents | 2016

Trends of structural and electrical properties in atomic layer deposited HfO2 films

Scarel, G. / Spiga, S. / Wiemer, C. et al. | British Library Online Contents | 2004

Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface

Patil, V.S. / Agrawal, K.S. / Khairnar, A.G. et al. | British Library Online Contents | 2017

Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface

Patil, V.S. / Agrawal, K.S. / Khairnar, A.G. et al. | British Library Online Contents | 2017

Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition

Chesnokov, Y. M. / Miakonkikh, A. V. / Rogozhin, A. E. et al. | British Library Online Contents | 2018