Silicon surface passivation using thin HfO2 films by atomic layer deposition

Gope, J. / Batra, N. / Panigrahi, J. et al. | British Library Online Contents | 2015

Growth, microstructure and electrical properties of sputter-deposited hafnium oxide (HfO2) thin films grown using a HfO2 ceramic target

Aguirre, B. / Vemuri, R. S. / Zubia, D. et al. | British Library Online Contents | 2011

Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer

Fu, W. E. / Chang, C. W. / Chang, Y. Q. et al. | British Library Online Contents | 2012

Improved interface properties of atomic-layer-deposited HfO2 film on InP using interface sulfur passivation with H2S pre-deposition annealing

Jin, H. S. / Cho, Y. J. / Seok, T. J. et al. | British Library Online Contents | 2015

Trends of structural and electrical properties in atomic layer deposited HfO2 films

Scarel, G. / Spiga, S. / Wiemer, C. et al. | British Library Online Contents | 2004