Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
The invention relates to an oxide sintered body (1) in which the average value of the Vickers Hardness values of the surface of the oxide sintered body (1) is 500 to 900 Hv exclusive.
本发明涉及一种氧化物烧结体(1)，氧化物烧结体(1)的表面的维氏硬度的平均值超过500Hv、小于900Hv。
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
The invention relates to an oxide sintered body (1) in which the average value of the Vickers Hardness values of the surface of the oxide sintered body (1) is 500 to 900 Hv exclusive.
本发明涉及一种氧化物烧结体(1)，氧化物烧结体(1)的表面的维氏硬度的平均值超过500Hv、小于900Hv。
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
氧化物烧结体、溅射靶及溅射靶的制造方法
KAIJO AKIRA (Autor:in)
21.09.2021
Patent
Elektronische Ressource
Chinesisch
Oxide sintered body, sputtering target, and method for producing sputtering target
| Europäisches Patentamt | 2021
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
| Europäisches Patentamt | 2020
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
| Europäisches Patentamt | 2020