Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
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Preparation method of high-density low-mobility indium zinc oxide rare earth doped target material
The invention belongs to the technical field of target material manufacturing, and relates to a preparation method of a high-density low-mobility indium zinc oxide rare earth doped target material, which comprises the following steps: S1, selecting indium oxide, zinc oxide, praseodymium oxide and zirconium oxide as raw materials; s2, according to the mass percent, 2%-4% of praseodymium oxide, 80%-85% of indium oxide, 12%-17% of zinc oxide and 1%-6% of zirconium oxide are weighed, mixed powder is prepared, slurry ball milling is conducted, and S3, the obtained slurry is dried and then calcined; step S4, secondary ball milling; s5, sanding the slurry; step S6, carrying out powder granulation on the obtained powder; s7, performing primary forming on the target material; s8, carrying out secondary cold isostatic pressing molding on the target material; according to the preparation method, indium oxide, zinc oxide, praseodymium oxide and zirconium oxide are selected as raw materials, the proportion of the indium oxide, the zinc oxide, the praseodymium oxide and the zirconium oxide is regulated, the pressurized atmosphere furnace is used for sintering, and the density of the indium zinc oxide target material can be effectively improved.
本发明属于靶材制造技术领域，涉及一种高密度低迁移率的氧化铟锌稀土掺杂靶材的制备方法，步骤S1原材料选择氧化铟、氧化锌、氧化镨、氧化锆；步骤S2按照质量百分比，氧化镨：氧化铟：氧化锌：氧化锆＝2％～4％：80％～85％：12～17％：1～6％，称取原料混合配粉进行浆料球磨，步骤S3将得到的浆料烘干后进行煅烧；步骤S4二次球磨；步骤S5浆料砂磨；步骤S6将得到的粉末进行粉末造粒；步骤S7靶材一次成型；步骤S8靶材二次冷等静压成型；步骤S9将得到素坯放入到加压气氛烧结炉中烧结，本发明选择氧化铟、氧化锌、氧化镨、氧化锆为原材料，并调控之间的比例，使用加压气氛炉进行烧结，能够有效提高氧化铟锌靶材密度。
Preparation method of high-density low-mobility indium zinc oxide rare earth doped target material
The invention belongs to the technical field of target material manufacturing, and relates to a preparation method of a high-density low-mobility indium zinc oxide rare earth doped target material, which comprises the following steps: S1, selecting indium oxide, zinc oxide, praseodymium oxide and zirconium oxide as raw materials; s2, according to the mass percent, 2%-4% of praseodymium oxide, 80%-85% of indium oxide, 12%-17% of zinc oxide and 1%-6% of zirconium oxide are weighed, mixed powder is prepared, slurry ball milling is conducted, and S3, the obtained slurry is dried and then calcined; step S4, secondary ball milling; s5, sanding the slurry; step S6, carrying out powder granulation on the obtained powder; s7, performing primary forming on the target material; s8, carrying out secondary cold isostatic pressing molding on the target material; according to the preparation method, indium oxide, zinc oxide, praseodymium oxide and zirconium oxide are selected as raw materials, the proportion of the indium oxide, the zinc oxide, the praseodymium oxide and the zirconium oxide is regulated, the pressurized atmosphere furnace is used for sintering, and the density of the indium zinc oxide target material can be effectively improved.
本发明属于靶材制造技术领域，涉及一种高密度低迁移率的氧化铟锌稀土掺杂靶材的制备方法，步骤S1原材料选择氧化铟、氧化锌、氧化镨、氧化锆；步骤S2按照质量百分比，氧化镨：氧化铟：氧化锌：氧化锆＝2％～4％：80％～85％：12～17％：1～6％，称取原料混合配粉进行浆料球磨，步骤S3将得到的浆料烘干后进行煅烧；步骤S4二次球磨；步骤S5浆料砂磨；步骤S6将得到的粉末进行粉末造粒；步骤S7靶材一次成型；步骤S8靶材二次冷等静压成型；步骤S9将得到素坯放入到加压气氛烧结炉中烧结，本发明选择氧化铟、氧化锌、氧化镨、氧化锆为原材料，并调控之间的比例，使用加压气氛炉进行烧结，能够有效提高氧化铟锌靶材密度。
Preparation method of high-density low-mobility indium zinc oxide rare earth doped target material
一种高密度低迁移率的氧化铟锌稀土掺杂靶材的制备方法
ZENG DUNFENG (Autor:in) / CHEN GUANGYUAN (Autor:in) / WANG ZHIQIANG (Autor:in) / ZENG TAN (Autor:in)
21.11.2023
Patent
Elektronische Ressource
Chinesisch
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