Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Tin oxide-based target material as well as preparation method and application thereof
The invention belongs to the technical field of target materials, and particularly discloses a tin oxide-based target material and a preparation method and application thereof. The stannic oxide-based target material is prepared from the following raw materials in parts by mass: 91 to 95 parts of stannic oxide, 1.5 to 3.5 parts of tantalum oxide, 1.5 to 3.5 parts of zinc oxide, 0.5 to 2 parts of tungsten oxide, 0.3 to 1.5 parts of gadolinium oxide, a binder and a plasticizer. The invention also provides a preparation method and application of the tin oxide-based target material. The tin oxide-based target material provided by the invention has high density and extremely low resistivity, the density is greater than or equal to 6.5 g/m < 3 >, and the resistivity is less than or equal to 1 * 10 <-2 > omega.cm, so that the tin oxide-based target material can be suitable for magnetron sputtering coating of a DC power supply; besides, the tin oxide-based target material disclosed by the invention has the advantages of good light transmittance and low resistivity, so that the conversion efficiency of the battery can be improved, and the tin oxide-based target material can be applied to a photovoltaic heterojunction battery and a perovskite battery.
本发明属于靶材技术领域，具体公开了一种氧化锡基靶材及其制备方法和应用。本发明的氧化锡基靶材的制备原料按质量份数计包括：氧化锡91～95份、氧化钽1.5～3.5份、氧化锌1.5～3.5份、氧化钨0.5～2份、氧化钆0.3～1.5，此外还包括粘结剂和增塑剂。本发明还提供该氧化锡基靶材的制备方法和应用。本发明提供的氧化锡基靶材具有高致密度和极低的电阻率，其密度≥6.5g/m3，电阻率≤1×10‑2Ω·cm，因此该氧化锡基靶材能适用于DC直流电源磁控溅射镀膜；此外，本发明的氧化锡基靶材还因为具有良好的光透过率、低电阻率的优势，能提高电池转换效率，可以应用于光伏异质结电池以及钙钛矿电池。
Tin oxide-based target material as well as preparation method and application thereof
The invention belongs to the technical field of target materials, and particularly discloses a tin oxide-based target material and a preparation method and application thereof. The stannic oxide-based target material is prepared from the following raw materials in parts by mass: 91 to 95 parts of stannic oxide, 1.5 to 3.5 parts of tantalum oxide, 1.5 to 3.5 parts of zinc oxide, 0.5 to 2 parts of tungsten oxide, 0.3 to 1.5 parts of gadolinium oxide, a binder and a plasticizer. The invention also provides a preparation method and application of the tin oxide-based target material. The tin oxide-based target material provided by the invention has high density and extremely low resistivity, the density is greater than or equal to 6.5 g/m < 3 >, and the resistivity is less than or equal to 1 * 10 <-2 > omega.cm, so that the tin oxide-based target material can be suitable for magnetron sputtering coating of a DC power supply; besides, the tin oxide-based target material disclosed by the invention has the advantages of good light transmittance and low resistivity, so that the conversion efficiency of the battery can be improved, and the tin oxide-based target material can be applied to a photovoltaic heterojunction battery and a perovskite battery.
本发明属于靶材技术领域，具体公开了一种氧化锡基靶材及其制备方法和应用。本发明的氧化锡基靶材的制备原料按质量份数计包括：氧化锡91～95份、氧化钽1.5～3.5份、氧化锌1.5～3.5份、氧化钨0.5～2份、氧化钆0.3～1.5，此外还包括粘结剂和增塑剂。本发明还提供该氧化锡基靶材的制备方法和应用。本发明提供的氧化锡基靶材具有高致密度和极低的电阻率，其密度≥6.5g/m3，电阻率≤1×10‑2Ω·cm，因此该氧化锡基靶材能适用于DC直流电源磁控溅射镀膜；此外，本发明的氧化锡基靶材还因为具有良好的光透过率、低电阻率的优势，能提高电池转换效率，可以应用于光伏异质结电池以及钙钛矿电池。
Tin oxide-based target material as well as preparation method and application thereof
一种氧化锡基靶材及其制备方法和应用
GAO YUHANG (Autor:in) / CHEN LU (Autor:in) / GE CHUNQIAO (Autor:in)
07.05.2024
Patent
Elektronische Ressource
Chinesisch
Tin oxide-based evaporation target material as well as preparation method and application thereof
| Europäisches Patentamt | 2024
Zinc oxide-based sputtering target material as well as preparation method and application thereof
| Europäisches Patentamt | 2025
| Europäisches Patentamt | 2024
High-density magnesium oxide target material as well as preparation method and application thereof
| Europäisches Patentamt | 2024
| Europäisches Patentamt | 2024