Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Antimony selenide sputtering target material and preparation method thereof
The invention belongs to the technical field of solar cell sputtering materials, and discloses an antimony selenide sputtering target material and a preparation method thereof. The preparation method comprises the following steps: mixing selenium particles and antimony particles, putting the mixture into a tubular furnace, heating to 215-230 DEG C under a protective atmosphere, carrying out calcination treatment, heating to 650-680 DEG C, carrying out high-temperature sintering, and cooling the material along with the furnace to obtain an antimony selenide ingot; crushing the antimony selenide ingot, and sieving with a stainless steel screen of 325-360 meshes to obtain antimony selenide alloy powder of which the particle size is less than 45 microns; and the antimony selenide alloy powder is pre-pressed to obtain an antimony selenide blank, the temperature is increased to 505-510 DEG C under the vacuum condition, the pressure is increased to 35-38 T, hot isostatic pressing forming is conducted, and the antimony selenide sputtering target material is obtained. According to the method, selenium particles and antimony particles are used as raw materials, and the antimony selenide sputtering target material obtained through the working procedures of high-temperature sintering, crushing and screening, hot isostatic pressing forming and the like has the advantages of being high in density and purity, uniform in component and the like.
本发明属于太阳能电池溅射材料技术领域，公开了一种硒化锑溅射靶材及其制备方法。所述制备方法包括如下步骤：将硒粒和锑粒混合后放进管式炉中，保护气氛下升温至215～230℃进行煅烧处理，然后升温至650～680℃进行高温烧结，物料随炉冷却，得到硒化锑锭；然后把硒化锑锭破碎后过325～360目不锈钢筛网，得到粒径＜45μm的硒化锑合金粉；将硒化锑合金粉经预压得到硒化锑坯体，在真空条件下升温至505～510℃并加压至35～38T热等静压成型，得到硒化锑溅射靶材。本发明以硒粒和锑粒为原料，通过高温烧结、破碎筛分和热等静压成型等工序，所得硒化锑溅射靶材具有致密度高，纯度高，组分均匀等优点。
Antimony selenide sputtering target material and preparation method thereof
The invention belongs to the technical field of solar cell sputtering materials, and discloses an antimony selenide sputtering target material and a preparation method thereof. The preparation method comprises the following steps: mixing selenium particles and antimony particles, putting the mixture into a tubular furnace, heating to 215-230 DEG C under a protective atmosphere, carrying out calcination treatment, heating to 650-680 DEG C, carrying out high-temperature sintering, and cooling the material along with the furnace to obtain an antimony selenide ingot; crushing the antimony selenide ingot, and sieving with a stainless steel screen of 325-360 meshes to obtain antimony selenide alloy powder of which the particle size is less than 45 microns; and the antimony selenide alloy powder is pre-pressed to obtain an antimony selenide blank, the temperature is increased to 505-510 DEG C under the vacuum condition, the pressure is increased to 35-38 T, hot isostatic pressing forming is conducted, and the antimony selenide sputtering target material is obtained. According to the method, selenium particles and antimony particles are used as raw materials, and the antimony selenide sputtering target material obtained through the working procedures of high-temperature sintering, crushing and screening, hot isostatic pressing forming and the like has the advantages of being high in density and purity, uniform in component and the like.
本发明属于太阳能电池溅射材料技术领域，公开了一种硒化锑溅射靶材及其制备方法。所述制备方法包括如下步骤：将硒粒和锑粒混合后放进管式炉中，保护气氛下升温至215～230℃进行煅烧处理，然后升温至650～680℃进行高温烧结，物料随炉冷却，得到硒化锑锭；然后把硒化锑锭破碎后过325～360目不锈钢筛网，得到粒径＜45μm的硒化锑合金粉；将硒化锑合金粉经预压得到硒化锑坯体，在真空条件下升温至505～510℃并加压至35～38T热等静压成型，得到硒化锑溅射靶材。本发明以硒粒和锑粒为原料，通过高温烧结、破碎筛分和热等静压成型等工序，所得硒化锑溅射靶材具有致密度高，纯度高，组分均匀等优点。
Antimony selenide sputtering target material and preparation method thereof
一种硒化锑溅射靶材及其制备方法
ZHANG SHAOZHEN (Autor:in) / XIAO CHONG (Autor:in) / ZHOU HUIXIA (Autor:in)
13.09.2024
Patent
Elektronische Ressource
Chinesisch
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