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In-situ investigations of radical kinetics in the deposition of hydrogenated amorphous silicon films
In-situ investigations of radical kinetics in the deposition of hydrogenated amorphous silicon films
In-situ investigations of radical kinetics in the deposition of hydrogenated amorphous silicon films
Tachibana, K. (author)
1993-01-01
68 pages
Article (Journal)
Unknown
DDC:
620.11
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