An X-ray photoelectron spectroscopy study of the thermal oxidation and nitridation of Si(100)-2 X 1 by NO~2: Fid-Bau Portal

An X-ray photoelectron spectroscopy study of the thermal oxidation and nitridation of Si(100)-2 X 1 by NO~2

Lutz, F. / Bischoff, J. L. / Kubler, L. / Bolmont, D.

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An X-ray photoelectron spectroscopy study of the thermal oxidation and nitridation of Si(100)-2 X 1 by NO~2

Lutz, F. / Bischoff, J. L. / Kubler, L. / Bolmont, D.

An X-ray photoelectron spectroscopy study of the thermal oxidation and nitridation of Si(100)-2 X 1 by NO~2

Lutz, F. / Bischoff, J. L. / Kubler, L. / Bolmont, D.

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Document information

Title:

An X-ray photoelectron spectroscopy study of the thermal oxidation and nitridation of Si(100)-2 X 1 by NO~2

Contributors:

Lutz, F. (author) / Bischoff, J. L. (author) / Kubler, L. (author) / Bolmont, D. (author)

Published in:

APPLIED SURFACE SCIENCE ; 72 ; 427

Publication date:

1993-01-01

Size:

427 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

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