Low-temperature chemical vapor deposition of tantalum nitride from tantalum pentabromide for integrated circuitry copper metallization applications: Fid-Bau Portal

Low-temperature chemical vapor deposition of tantalum nitride from tantalum pentabromide for integrated circuitry copper metallization applications

Chen, X. / Peterson, G. G. / Goldberg, C. / Nuesca, G. / Frisch, H. L. / Kaloyeros, A. E. / Arkles, B. / Sullivan, J.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Low-temperature chemical vapor deposition of tantalum nitride from tantalum pentabromide for integrated circuitry copper metallization applications

Chen, X. / Peterson, G. G. / Goldberg, C. / Nuesca, G. / Frisch, H. L. / Kaloyeros, A. E. / Arkles, B. / Sullivan, J.

Low-temperature chemical vapor deposition of tantalum nitride from tantalum pentabromide for integrated circuitry copper metallization applications

Chen, X. / Peterson, G. G. / Goldberg, C. / Nuesca, G. / Frisch, H. L. / Kaloyeros, A. E. / Arkles, B. / Sullivan, J.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Low-temperature chemical vapor deposition of tantalum nitride from tantalum pentabromide for integrated circuitry copper metallization applications

Contributors:

Chen, X. (author) / Peterson, G. G. (author) / Goldberg, C. (author) / Nuesca, G. (author) / Frisch, H. L. (author) / Kaloyeros, A. E. (author) / Arkles, B. (author) / Sullivan, J. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 2043-2052

Publication date:

1999-01-01

Size:

10 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

van der Straten, O. / Zhu, Y. / Dunn, K. et al. | British Library Online Contents | 2004

Tantalum diffusion barrier grown by inorganic plasma-promoted chemical vapor deposition: Performance in copper metallization

Kaloyeros, A. E. / Chen, X. / Lane, S. et al. | British Library Online Contents | 2000

Synthesis of chemical vapor deposition graphene on tantalum wire for supercapacitor applications

Li, M. / Guo, W. / Li, H. et al. | British Library Online Contents | 2014

Oxidation of Tantalum Nitride

Hamaguchi, K. / Tsuchiyama, T. / Matsushita, J. | British Library Online Contents | 2013

Sputter Deposition of Tantalum-Nitride Films on Copper Using an RF-Plasma

Walter, K. C. / Fetherston, R. P. / Sridharan, K. et al. | British Library Online Contents | 1994