A platform for research: civil engineering, architecture and urbanism
Texture and Grain Structure Effects on the Reliability of Microelectronic Interconnects
Texture and Grain Structure Effects on the Reliability of Microelectronic Interconnects
Texture and Grain Structure Effects on the Reliability of Microelectronic Interconnects
Knorr, D. B. (author) / Rodbell, K. P. (author)
MATERIALS SCIENCE FORUM ; 1435
1994-01-01
1435 pages
Article (Journal)
Unknown
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Electron tomography of microelectronic device interconnects
British Library Online Contents | 2006
|Grain structure effect on electromigration reliability of Cu interconnects with CoWP capping
British Library Online Contents | 2011
|Texture Investigations In Damascene Copper Interconnects
British Library Online Contents | 2002
|British Library Online Contents | 2001
|Scaling effects on microstructure and reliability for Cu interconnects
British Library Online Contents | 2010
|