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    Modeling of the effects of crystallographic orientation on electromigration-limited reliability of interconnects with bamboo grain structures

    New search for: Fayad, W. R.
    New search for: Andleigh, V. K.
    New search for: Thompson, C. V.

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    Modeling of the effects of crystallographic orientation on electromigration-limited reliability of interconnects with bamboo grain structures

    New search for: Fayad, W. R.
    New search for: Andleigh, V. K.
    New search for: Thompson, C. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Modeling of the effects of crystallographic orientation on electromigration-limited reliability of interconnects with bamboo grain structures

    New search for: Fayad, W. R.
    New search for: Andleigh, V. K.
    New search for: Thompson, C. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Modeling of the effects of crystallographic orientation on electromigration-limited reliability of interconnects with bamboo grain structures

    Contributors:

    Fayad, W. R. (author) / Andleigh, V. K. (author) / Thompson, C. V. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 16 ; 413-416

    Publication date:

    2001-01-01

    Size:

    4 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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