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    Photoresist-free lithography of 3 m wide UO~3 lines from amorphous films of uranyl complexes

    New search for: Goetting, L. B.
    New search for: Palmer, B. J.
    New search for: Gao, M.
    New search for: Hill, R. H.

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    Photoresist-free lithography of 3 m wide UO~3 lines from amorphous films of uranyl complexes

    New search for: Goetting, L. B.
    New search for: Palmer, B. J.
    New search for: Gao, M.
    New search for: Hill, R. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Photoresist-free lithography of 3 m wide UO~3 lines from amorphous films of uranyl complexes

    New search for: Goetting, L. B.
    New search for: Palmer, B. J.
    New search for: Gao, M.
    New search for: Hill, R. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Photoresist-free lithography of 3 m wide UO~3 lines from amorphous films of uranyl complexes

    Contributors:

    Goetting, L. B. (author) / Palmer, B. J. (author) / Gao, M. (author) / Hill, R. H. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 29 ; 6147

    Publication date:

    1994-01-01

    Size:

    6147 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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