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High efficiency photoresist-free lithography of UO~3 patterns from amorphous films of uranyl complexes

Gao, M. / Hill, R. H.

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High efficiency photoresist-free lithography of UO~3 patterns from amorphous films of uranyl complexes

Gao, M. / Hill, R. H.

High efficiency photoresist-free lithography of UO~3 patterns from amorphous films of uranyl complexes

Gao, M. / Hill, R. H.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

High efficiency photoresist-free lithography of UO~3 patterns from amorphous films of uranyl complexes

Contributors:

Gao, M. (author) / Hill, R. H. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 13 ; 1379-1389

Publication date:

1998-01-01

Size:

11 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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