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    Influences of water on photoresist surface in immersion lithography technology

    New search for: Sado, M.
    New search for: Teratani, T.
    New search for: Fujii, H.
    New search for: Iikawa, R.
    New search for: Iida, H.

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    Influences of water on photoresist surface in immersion lithography technology

    New search for: Sado, M.
    New search for: Teratani, T.
    New search for: Fujii, H.
    New search for: Iikawa, R.
    New search for: Iida, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influences of water on photoresist surface in immersion lithography technology

    New search for: Sado, M.
    New search for: Teratani, T.
    New search for: Fujii, H.
    New search for: Iikawa, R.
    New search for: Iida, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Influences of water on photoresist surface in immersion lithography technology

    Contributors:

    Sado, M. (author) / Teratani, T. (author) / Fujii, H. (author) / Iikawa, R. (author) / Iida, H. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 255 ; 1018-1021

    Publication date:

    2008-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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