Dopant Diffusion in Strained and Relaxed Si~1~-~xGe~x: Fid-Bau Portal

Dopant Diffusion in Strained and Relaxed Si~1~-~xGe~x

Paine, A. D. N. / Morooka, M. / Willoughby, A. F. W. / Bonar, J. M. / Phillips, P. / Dowsett, M. G. / Cooke, G.

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Dopant Diffusion in Strained and Relaxed Si~1~-~xGe~x

Paine, A. D. N. / Morooka, M. / Willoughby, A. F. W. / Bonar, J. M. / Phillips, P. / Dowsett, M. G. / Cooke, G.

Dopant Diffusion in Strained and Relaxed Si~1~-~xGe~x

Paine, A. D. N. / Morooka, M. / Willoughby, A. F. W. / Bonar, J. M. / Phillips, P. / Dowsett, M. G. / Cooke, G.

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Document information

Title:

Dopant Diffusion in Strained and Relaxed Si~1~-~xGe~x

Contributors:

Paine, A. D. N. (author) / Morooka, M. (author) / Willoughby, A. F. W. (author) / Bonar, J. M. (author) / Phillips, P. (author) / Dowsett, M. G. (author) / Cooke, G. (author)

Published in:

MATERIALS SCIENCE FORUM ; 345-348

Publication date:

1995-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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