Photochemical vapour deposition of hydrogenated amorphous silicon-carbon thin films by using a Xe^*~2 excimer lamp: Fid-Bau Portal

Photochemical vapour deposition of hydrogenated amorphous silicon-carbon thin films by using a Xe^*~2 excimer lamp

Redondas, X. / Gonzalez, P. / Chiussi, S. / Parada, E. G. / Pou, J. / Leon, B. / Perez-Amor, M.

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Photochemical vapour deposition of hydrogenated amorphous silicon-carbon thin films by using a Xe^*~2 excimer lamp

Redondas, X. / Gonzalez, P. / Chiussi, S. / Parada, E. G. / Pou, J. / Leon, B. / Perez-Amor, M.

Photochemical vapour deposition of hydrogenated amorphous silicon-carbon thin films by using a Xe^*~2 excimer lamp

Redondas, X. / Gonzalez, P. / Chiussi, S. / Parada, E. G. / Pou, J. / Leon, B. / Perez-Amor, M.

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Document information

Title:

Photochemical vapour deposition of hydrogenated amorphous silicon-carbon thin films by using a Xe^*~2 excimer lamp

Contributors:

Redondas, X. (author) / Gonzalez, P. (author) / Chiussi, S. (author) / Parada, E. G. (author) / Pou, J. (author) / Leon, B. (author) / Perez-Amor, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 106 ; 55-59

Publication date:

1996-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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