Effect of Post-Oxidation Annealing on High-Temperature Grown SiO~2/4H-SiC Interface

Moon, J.H. / Cheong, K.Y. / Song, H.K. et al. | British Library Online Contents | 2009

Impact of post-nitridation annealing on ultra-thin gate oxide performance

He, Y. / Zhang, G. | British Library Online Contents | 2009

UV assisted low temperature nitridation and post deposition oxidation technique for hafnium oxide gate dielectric

Son, S. Y. / Jang, J. H. / Kumar, P. et al. | British Library Online Contents | 2008

Characteristics of Post-Nitridation Rapid-Thermal Annealed Gate Oxide Grown on 4H-SiC

Cheong, K. Y. / Bahng, W. / Kim, N. K. | British Library Online Contents | 2005

Role of H~2 in Low Temperature Post-Oxidation Anneal for Gate Oxide on 6H-SiC

Raineri, V. / Lombardo, S. / Musumeci, P. et al. | British Library Online Contents | 2001