A platform for research: civil engineering, architecture and urbanism
Ultra-shallow junction formation by spike annealing in a lamp-based or hot-walled rapid thermal annealing system: effect of ramp-up rate
Ultra-shallow junction formation by spike annealing in a lamp-based or hot-walled rapid thermal annealing system: effect of ramp-up rate
Ultra-shallow junction formation by spike annealing in a lamp-based or hot-walled rapid thermal annealing system: effect of ramp-up rate
Agarwal, A. (author) / Fiory, A. T. (author) / Gossmann, H.-J. L. (author) / Rafferty, C. S. (author) / Frisella, P. (author) / Slaoui, A. / Singh, R. K. / Theiler, T. / Muller, J. C.
1998-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2008
|Ultra-Shallow Junction Formation Using Rapid Thermal Processing
British Library Online Contents | 2008
|Ultra-shallow junctions produced by plasma doping and flash lamp annealing
British Library Online Contents | 2004
|British Library Online Contents | 2017
|British Library Online Contents | 2017
|