Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Composition, oxidation, and optical properties of fluorinated silicon nitride film by inductively coupled plasma enhanced chemical vapor deposition

    New search for: Jun, B.-H.
    New search for: Joon Sing Lee
    New search for: Kim, D.-W.
    New search for: Tae Hyan Sung
    New search for: Bae, B.-S.
    New search for: No, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Composition, oxidation, and optical properties of fluorinated silicon nitride film by inductively coupled plasma enhanced chemical vapor deposition

    New search for: Jun, B.-H.
    New search for: Joon Sing Lee
    New search for: Kim, D.-W.
    New search for: Tae Hyan Sung
    New search for: Bae, B.-S.
    New search for: No, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Composition, oxidation, and optical properties of fluorinated silicon nitride film by inductively coupled plasma enhanced chemical vapor deposition

    New search for: Jun, B.-H.
    New search for: Joon Sing Lee
    New search for: Kim, D.-W.
    New search for: Tae Hyan Sung
    New search for: Bae, B.-S.
    New search for: No, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Composition, oxidation, and optical properties of fluorinated silicon nitride film by inductively coupled plasma enhanced chemical vapor deposition

    Contributors:

    Jun, B.-H. (author) / Joon Sing Lee (author) / Kim, D.-W. (author) / Tae Hyan Sung (author) / Bae, B.-S. (author) / No, K. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 995-1001

    Publication date:

    1999-01-01

    Size:

    7 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Inductively coupled plasma - plasma enhanced chemical vapor deposition silicon nitride for passivation of InP based high electron mobility transistors (HEMTs)

    Medjdoub, M. / Courant, J. L. / Maher, H. et al. | British Library Online Contents | 2001

    The structure and optical properties of silicon nanowires prepared by inductively coupled plasma chemical vapor deposition

    Qin, Y. / Li, F. / Liu, D. et al. | British Library Online Contents | 2011

    The optical properties of silicon-rich silicon nitride prepared by plasma-enhanced chemical vapor deposition

    Yoshinaga, Seiya / Ishikawa, Yasuaki / Kawamura, Yusuke et al. | British Library Online Contents | 2019

    Effect of Plasma Enhanced Chemical Vapor Deposition Parameters on Characteristics of Silicon nitride Film

    Li, X.-b. / Zhang, F.-h. | British Library Online Contents | 2006

    Reduced bias synthesis of cubic boron nitride thin films by magnetically enhanced inductively coupled radio frequency plasma chemical vapor deposition

    Chattopadhyay, K. K. / Banerjee, A. N. / Kundoo, S. | British Library Online Contents | 2003

    Back to top