Growth of carbon nitride thin films by radio-frequency-plasma-enhanced chemical vapor deposition at low temperatures: Fid-Bau Portal

Growth of carbon nitride thin films by radio-frequency-plasma-enhanced chemical vapor deposition at low temperatures

Lim, S. F. / Wee, A. T. S. / Lin, J. / Chua, D. H. C. / Tan, K. L.

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Growth of carbon nitride thin films by radio-frequency-plasma-enhanced chemical vapor deposition at low temperatures

Lim, S. F. / Wee, A. T. S. / Lin, J. / Chua, D. H. C. / Tan, K. L.

Growth of carbon nitride thin films by radio-frequency-plasma-enhanced chemical vapor deposition at low temperatures

Lim, S. F. / Wee, A. T. S. / Lin, J. / Chua, D. H. C. / Tan, K. L.

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Check availability in my library

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Document information

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Document information

Title:

Growth of carbon nitride thin films by radio-frequency-plasma-enhanced chemical vapor deposition at low temperatures

Contributors:

Lim, S. F. (author) / Wee, A. T. S. (author) / Lin, J. (author) / Chua, D. H. C. (author) / Tan, K. L. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 1153-1159

Publication date:

1999-01-01

Size:

7 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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