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    Plasma enhanced chemical vapour deposition of SiO"xN"y in an integrated distributed electron cyclotron resonance reactor

    New search for: Hofrichter, A.
    New search for: Bulkin, P.
    New search for: Drevillon, B.

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    Plasma enhanced chemical vapour deposition of SiO"xN"y in an integrated distributed electron cyclotron resonance reactor

    New search for: Hofrichter, A.
    New search for: Bulkin, P.
    New search for: Drevillon, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Plasma enhanced chemical vapour deposition of SiO"xN"y in an integrated distributed electron cyclotron resonance reactor

    New search for: Hofrichter, A.
    New search for: Bulkin, P.
    New search for: Drevillon, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Plasma enhanced chemical vapour deposition of SiO"xN"y in an integrated distributed electron cyclotron resonance reactor

    Contributors:

    Hofrichter, A. (author) / Bulkin, P. (author) / Drevillon, B. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 142 ; 447-450

    Publication date:

    1999-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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