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    Effects of rapid thermal annealing on ripple growth in excimer laser-irradiated silicon-dioxide/silicon substrates

    New search for: Yu, J. J.
    New search for: Lu, Y. F.

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    Effects of rapid thermal annealing on ripple growth in excimer laser-irradiated silicon-dioxide/silicon substrates

    New search for: Yu, J. J.
    New search for: Lu, Y. F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effects of rapid thermal annealing on ripple growth in excimer laser-irradiated silicon-dioxide/silicon substrates

    New search for: Yu, J. J.
    New search for: Lu, Y. F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Effects of rapid thermal annealing on ripple growth in excimer laser-irradiated silicon-dioxide/silicon substrates

    Contributors:

    Yu, J. J. (author) / Lu, Y. F. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 154-155 ; 670-674

    Publication date:

    2000-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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