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Growth of high quality silicon carbide films on Si by triode plasma CVD using monomethylsilane
Growth of high quality silicon carbide films on Si by triode plasma CVD using monomethylsilane
Growth of high quality silicon carbide films on Si by triode plasma CVD using monomethylsilane
Yasui, K. (author) / Asada, K. (author) / Maeda, T. (author) / Akahane, T. (author)
APPLIED SURFACE SCIENCE ; 175-176 ; 495-498
2001-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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