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    Influence of the Post-Oxidation Process on the MOS Interface and MOSFETs Properties

    New search for: Suzuki, S.
    New search for: Cho, W. J.
    New search for: Kosugi, R.
    New search for: Senzaki, J.
    New search for: Harada, S.
    New search for: Fukuda, K.

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    Influence of the Post-Oxidation Process on the MOS Interface and MOSFETs Properties

    New search for: Suzuki, S.
    New search for: Cho, W. J.
    New search for: Kosugi, R.
    New search for: Senzaki, J.
    New search for: Harada, S.
    New search for: Fukuda, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of the Post-Oxidation Process on the MOS Interface and MOSFETs Properties

    New search for: Suzuki, S.
    New search for: Cho, W. J.
    New search for: Kosugi, R.
    New search for: Senzaki, J.
    New search for: Harada, S.
    New search for: Fukuda, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Influence of the Post-Oxidation Process on the MOS Interface and MOSFETs Properties

    Contributors:

    Suzuki, S. (author) / Cho, W. J. (author) / Kosugi, R. (author) / Senzaki, J. (author) / Harada, S. (author) / Fukuda, K. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 353/356 ; 643-646

    Publication date:

    2001-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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