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Deposition and characterization of low temperature silicon nitride films deposited by inductively coupled plasma CVD

Kshirsagar, A. / Nyaupane, P. / Bodas, D. / Duttagupta, S. P. / Gangal, S. A.

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Deposition and characterization of low temperature silicon nitride films deposited by inductively coupled plasma CVD

Kshirsagar, A. / Nyaupane, P. / Bodas, D. / Duttagupta, S. P. / Gangal, S. A.

Deposition and characterization of low temperature silicon nitride films deposited by inductively coupled plasma CVD

Kshirsagar, A. / Nyaupane, P. / Bodas, D. / Duttagupta, S. P. / Gangal, S. A.

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Document information

Title:

Deposition and characterization of low temperature silicon nitride films deposited by inductively coupled plasma CVD

Contributors:

Kshirsagar, A. (author) / Nyaupane, P. (author) / Bodas, D. (author) / Duttagupta, S. P. (author) / Gangal, S. A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 5052-5058

Publication date:

2011-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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