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Quantitative analysis of the top 5 nm of boron ultra-shallow implants

Bellingham, J. / Dowsett, M. G. / Collart, E. / Kirkwood, D.

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Quantitative analysis of the top 5 nm of boron ultra-shallow implants

Bellingham, J. / Dowsett, M. G. / Collart, E. / Kirkwood, D.

Quantitative analysis of the top 5 nm of boron ultra-shallow implants

Bellingham, J. / Dowsett, M. G. / Collart, E. / Kirkwood, D.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Quantitative analysis of the top 5 nm of boron ultra-shallow implants

Contributors:

Bellingham, J. (author) / Dowsett, M. G. (author) / Collart, E. (author) / Kirkwood, D. (author)

Published in:

APPLIED SURFACE SCIENCE ; 203-204 ; 851-854

Publication date:

2003-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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