Doubleside polishing-a technology mandatory for 300mm wafer manufacturing: Fid-Bau Portal

Doubleside polishing-a technology mandatory for 300mm wafer manufacturing

Wenski, G. / Altmann, T. / Winkler, W. / Heier, G. / Holker, G.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Doubleside polishing-a technology mandatory for 300mm wafer manufacturing

Wenski, G. / Altmann, T. / Winkler, W. / Heier, G. / Holker, G.

Doubleside polishing-a technology mandatory for 300mm wafer manufacturing

Wenski, G. / Altmann, T. / Winkler, W. / Heier, G. / Holker, G.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Doubleside polishing-a technology mandatory for 300mm wafer manufacturing

Contributors:

Wenski, G. (author) / Altmann, T. (author) / Winkler, W. (author) / Heier, G. (author) / Holker, G. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 5 ; 375-380

Publication date:

2002-01-01

Size:

6 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

Dragoi, V. / Lindner, P. / Tischler, M. et al. | British Library Online Contents | 2002

Design and Construction Issues for 300mm Semiconductor Manufacturing Facilities

Merchant, S. / Chasey, A. / American Society of Civil Engineers | British Library Conference Proceedings | 2000

Spheron™ WLCSP Technology Qualification and Scale Up to 300mm

Cardoso, A. / Curtis, A. | British Library Online Contents | 2014

Defect requirements for advanced 300mm DRAM substrates

Kupfer, C. / Roth, H. / Dietrich, H. | British Library Online Contents | 2002

E-MRS Spring Meeting 2002. The 300mm Silicon Era: Material, Equipment, Technology

Richter, H. / Umeno, M. / Wagner, P. | British Library Online Contents | 2002