Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Defect requirements for advanced 300mm DRAM substrates

    New search for: Kupfer, C.
    New search for: Roth, H.
    New search for: Dietrich, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Defect requirements for advanced 300mm DRAM substrates

    New search for: Kupfer, C.
    New search for: Roth, H.
    New search for: Dietrich, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Defect requirements for advanced 300mm DRAM substrates

    New search for: Kupfer, C.
    New search for: Roth, H.
    New search for: Dietrich, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Defect requirements for advanced 300mm DRAM substrates

    Contributors:

    Kupfer, C. (author) / Roth, H. (author) / Dietrich, H. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 5 ; 381-386

    Publication date:

    2002-01-01

    Size:

    6 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    A roadmap towards cost efficient 300mm equipment

    Pfitzner, L. / Kucher, P. | British Library Online Contents | 2002

    Doubleside polishing-a technology mandatory for 300mm wafer manufacturing

    Wenski, G. / Altmann, T. / Winkler, W. et al. | British Library Online Contents | 2002

    Design and Construction Issues for 300mm Semiconductor Manufacturing Facilities

    Merchant, S. / Chasey, A. / American Society of Civil Engineers | British Library Conference Proceedings | 2000

    Oxide precipitates in annealed nitrogen-doped 300mm CZ-SI

    Akhmetov, V. D. / Richter, H. / Lysytskiy, O. et al. | British Library Online Contents | 2002

    Advanced metallization technology for 256M DRAM

    Kuecher, P. / Aochi, H. / Gambino, J. et al. | British Library Online Contents | 1996

    Back to top