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Radio frequency bias power effect on surface roughness of silicon carbide plasma etching
Radio frequency bias power effect on surface roughness of silicon carbide plasma etching
Radio frequency bias power effect on surface roughness of silicon carbide plasma etching
Kim, B. (author) / Kim, K. (author) / Lee, B. T. (author)
APPLIED SURFACE SCIENCE ; 217 ; 261-267
2003-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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