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Comparison of p+-n junction formed by BF2+ and B+ implantation in silicon microstrip detector with low and high thermal budget: impact of fluorine on electrical characteristics
Comparison of p+-n junction formed by BF2+ and B+ implantation in silicon microstrip detector with low and high thermal budget: impact of fluorine on electrical characteristics
Comparison of p+-n junction formed by BF2+ and B+ implantation in silicon microstrip detector with low and high thermal budget: impact of fluorine on electrical characteristics
Srivastava, A. K. (author) / Bhardwaj, A. (author) / Ranjan, K. (author) / Chatterji, S. (author) / Shivpuri, R. K. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 6 ; 555-559
2003-01-01
5 pages
Article (Journal)
English
DDC:
621.38152
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