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Trends of structural and electrical properties in atomic layer deposited HfO2 films

Scarel, G. / Spiga, S. / Wiemer, C. / Tallarida, G. / Ferrari, S. / Fanciulli, M.

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Trends of structural and electrical properties in atomic layer deposited HfO2 films

Scarel, G. / Spiga, S. / Wiemer, C. / Tallarida, G. / Ferrari, S. / Fanciulli, M.

Trends of structural and electrical properties in atomic layer deposited HfO2 films

Scarel, G. / Spiga, S. / Wiemer, C. / Tallarida, G. / Ferrari, S. / Fanciulli, M.

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Access via TIB

Check availability in my library

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Document information

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Document information

Title:

Trends of structural and electrical properties in atomic layer deposited HfO2 films

Contributors:

Scarel, G. (author) / Spiga, S. (author) / Wiemer, C. (author) / Tallarida, G. (author) / Ferrari, S. (author) / Fanciulli, M. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 109 ; 11-16

Publication date:

2004-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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