Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Hydrogen redistribution in CVD SiO~2 during post-oxidation annealing investigated by SIMS

    New search for: Kawashima, Y.
    New search for: Kawano, H.
    New search for: Terashima, K.
    New search for: Hamada, K.
    New search for: Aoyagi, S.
    New search for: Kudo, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Hydrogen redistribution in CVD SiO~2 during post-oxidation annealing investigated by SIMS

    New search for: Kawashima, Y.
    New search for: Kawano, H.
    New search for: Terashima, K.
    New search for: Hamada, K.
    New search for: Aoyagi, S.
    New search for: Kudo, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Hydrogen redistribution in CVD SiO~2 during post-oxidation annealing investigated by SIMS

    New search for: Kawashima, Y.
    New search for: Kawano, H.
    New search for: Terashima, K.
    New search for: Hamada, K.
    New search for: Aoyagi, S.
    New search for: Kudo, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Hydrogen redistribution in CVD SiO~2 during post-oxidation annealing investigated by SIMS

    Contributors:

    Kawashima, Y. (author) / Kawano, H. (author) / Terashima, K. (author) / Hamada, K. (author) / Aoyagi, S. (author) / Kudo, M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 231/232 ; 758-761

    Publication date:

    2004-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    SIMS characterization of hydrogen transport through SiO2 by low-temperature hydrogen annealing

    Kawashima, Y. / Liu, Z. / Terashima, K. et al. | British Library Online Contents | 2003

    Hydrogen redistribution and enhanced thermal donor formation at post implantation annealing of p-type hydrogen implanted Czochralski silicon

    Ulyashin, A. G. / Ivanov, A. I. / Khorunzhii, I. A. et al. | British Library Online Contents | 1999

    Additive behavior in ultrathin polymer films investigated by ToF-SIMS

    Medard, N. / Bertrand, P. | British Library Online Contents | 2004

    Fluorine-doped SiO2 and fluorocarbon low-k dielectrics investigated by SIMS

    Cwil, M. / Kalisz, M. / Konarski, P. | British Library Online Contents | 2008

    Gate oxide properties investigated by TOF-SIMS profiles on CMOS devices

    Zanderigo, F. / Brazzelli, D. / Rocca, S. et al. | British Library Online Contents | 2003

    Back to top