Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Effect of as-deposited residual stress on transition temperatures of VO~2 thin films

    New search for: Tsai, K. Y.
    New search for: Chin, T.-S.
    New search for: Shieh, H.-P. D.
    New search for: Ma, C. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Effect of as-deposited residual stress on transition temperatures of VO~2 thin films

    New search for: Tsai, K. Y.
    New search for: Chin, T.-S.
    New search for: Shieh, H.-P. D.
    New search for: Ma, C. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of as-deposited residual stress on transition temperatures of VO~2 thin films

    New search for: Tsai, K. Y.
    New search for: Chin, T.-S.
    New search for: Shieh, H.-P. D.
    New search for: Ma, C. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effect of as-deposited residual stress on transition temperatures of VO~2 thin films

    Contributors:

    Tsai, K. Y. (author) / Chin, T.-S. (author) / Shieh, H.-P. D. (author) / Ma, C. H. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 19 ; 2306-2314

    Publication date:

    2004-01-01

    Size:

    9 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Residual Stress Reduction in Sputter Deposited Thin Films by Density Modulation

    Alagoz, A.S. / Kamminga, J.-D. / Grachev, S. et al. | British Library Conference Proceedings | 2010

    Residual stress and microstructure of as-deposited and annealed, sputtered yttria-stabilized zirconia thin films

    Quinn, D.J. / Wardle, B. / Spearing, S.M. | British Library Online Contents | 2008

    Residual Stress Evolution by the ex-situ Annealing of TiN Thin Films Deposited on Steel Substrates

    Ye, M. / Berton, G. / Delplancke, J. L. et al. | British Library Online Contents | 1998

    Residual Stress in Thin Films of Aluminum/Hafnium

    Rant, S. J. / Goldsmith, C. C. / Noyan, I. C. | British Library Online Contents | 1994

    Residual stress formation in electrolytically deposited metals

    Ignat kov, D. A. | British Library Online Contents | 2001

    Back to top