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Low leakage and high performance of nMOSFET using SiGe layer as a diffusion barrier

Mheen, B. / Song, Y. J. / Kang, J. Y. / Shim, K. H. / Hong, S.

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Low leakage and high performance of nMOSFET using SiGe layer as a diffusion barrier

Mheen, B. / Song, Y. J. / Kang, J. Y. / Shim, K. H. / Hong, S.

Low leakage and high performance of nMOSFET using SiGe layer as a diffusion barrier

Mheen, B. / Song, Y. J. / Kang, J. Y. / Shim, K. H. / Hong, S.

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Order at Subito €

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Document information

Title:

Low leakage and high performance of nMOSFET using SiGe layer as a diffusion barrier

Contributors:

Mheen, B. (author) / Song, Y. J. (author) / Kang, J. Y. (author) / Shim, K. H. (author) / Hong, S. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 375-378

Publication date:

2004-01-01

Size:

4 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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