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    Strain relaxation of epitaxial SiGe layer and Ge diffusion during Ni silicidation on cap-Si/SiGe/Si(001)

    New search for: Jang, C. H.
    New search for: Sardela, M. R.
    New search for: Kim, S. H.
    New search for: Song, Y. J.
    New search for: Lee, N. E.

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    Strain relaxation of epitaxial SiGe layer and Ge diffusion during Ni silicidation on cap-Si/SiGe/Si(001)

    New search for: Jang, C. H.
    New search for: Sardela, M. R.
    New search for: Kim, S. H.
    New search for: Song, Y. J.
    New search for: Lee, N. E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Strain relaxation of epitaxial SiGe layer and Ge diffusion during Ni silicidation on cap-Si/SiGe/Si(001)

    New search for: Jang, C. H.
    New search for: Sardela, M. R.
    New search for: Kim, S. H.
    New search for: Song, Y. J.
    New search for: Lee, N. E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Strain relaxation of epitaxial SiGe layer and Ge diffusion during Ni silicidation on cap-Si/SiGe/Si(001)

    Contributors:

    Jang, C. H. (author) / Sardela, M. R. (author) / Kim, S. H. (author) / Song, Y. J. (author) / Lee, N. E. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 252 ; 5326-5330

    Publication date:

    2006-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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