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Fabrication of thick, high-quality strained SiGe layer on ultra-thin silicon-on-insulator and modeling of film strain
Fabrication of thick, high-quality strained SiGe layer on ultra-thin silicon-on-insulator and modeling of film strain
Fabrication of thick, high-quality strained SiGe layer on ultra-thin silicon-on-insulator and modeling of film strain
Di, Z. (author) / Zhang, M. (author) / Liu, W. (author) / Lin, C. (author) / Chu, P. K. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 393-397
2004-01-01
5 pages
Article (Journal)
English
DDC:
621.38152
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